Purchase of an Oxygen Plasma Source
Aarhus Universitet
Directive 2014/24/EU
Section I: Contracting authority
I.1)
Name and addresses
Aarhus Universitet
311 19 103
Trøjborgvej 82-84
Aarhus C
8000
Denmark
Contact person: Camilla Ladekarl Sørensen
Telephone: +45 51335271
E-mail:
udbud@au.dk
NUTS code:
DK
Internet address(es):
Main address: www.au.dk
I.2)
Joint procurement
I.3)
Communication
The procurement documents are available for unrestricted and full direct access, free of charge, at:
www.au.dk/udbud
Additional information can be obtained from the abovementioned address
Tenders or requests to participate must be submitted to the abovementioned address
I.4)
Type of the contracting authority
Body governed by public law
I.5)
Main activity
Education
Section II: Object
II.1)
Scope of the procurement
II.1.1)
Title:
Purchase of an Oxygen Plasma Source.
Reference number: 2017-150-000029
II.1.2)
Main CPV code
38000000
II.1.3)
Type of contract
Supplies
II.1.4)
Short description:
Aarhus University will be investing in one (1) Oxygen Plasma Source for INANO.
Reactive ion etching is known as an efficient technique for surface cleaning in semiconductor technology and surface science. The plasma sources that are used for the reactive etching are also commonly used for the so-called ion-assisted deposition of thin films. There are several examples where this technique was successfully implemented and used in the surface science experiments on thin films growth and oxidation under UHV conditions. Thus, we expect that installation of an advanced plasma source in our UHV setup will significantly extend our experimental capabilities in terms of oxide surface preparation and growth of ultra-thin oxide films. We summarised minimal requirements in the attached form that must be fulfilled to meet our experimental needs.
II.1.5)
Estimated total value
Value excluding VAT: 13 685.00 EUR
II.1.6)
Information about lots
This contract is divided into lots: no
II.2)
Description
II.2.1)
Title:
II.2.2)
Additional CPV code(s)
II.2.3)
Place of performance
NUTS code:
DK
II.2.4)
Description of the procurement:
Aarhus University will be investing in one (1) Oxygen Plasma Source for INANO.
Reactive ion etching is known as an efficient technique for surface cleaning in semiconductor technology and surface science. The plasma sources that are used for the reactive etching are also commonly used for the so-called ion-assisted deposition of thin films. There are several examples where this technique was successfully implemented and used in the surface science experiments on thin films growth and oxidation under UHV conditions. Thus, we expect that installation of an advanced plasma source in our UHV setup will significantly extend our experimental capabilities in terms of oxide surface preparation and growth of ultra-thin oxide films. We summarised minimal requirements in the attached form that must be fulfilled to meet our experimental needs.
II.2.5)
Award criteria
Price is not the only award criterion and all criteria are stated only in the procurement documents
II.2.6)
Estimated value
II.2.7)
Duration of the contract, framework agreement or dynamic purchasing system
Duration in months: 2
This contract is subject to renewal: no
II.2.10)
Information about variants
Variants will be accepted: no
II.2.11)
Information about options
Options: no
II.2.12)
Information about electronic catalogues
II.2.13)
Information about European Union funds
The procurement is related to a project and/or programme financed by European Union funds: no
II.2.14)
Additional information
The purchase is published in accordance with the public procurement Act (Udbudsloven) § 191, because this contract has a total estimated value below the EU thresholds, but are considered to have cross-border interest.
Section III: Legal, economic, financial and technical information
III.1)
Conditions for participation
III.1.1)
Suitability to pursue the professional activity, including requirements relating to enrolment on professional or trade registers
III.1.2)
Economic and financial standing
III.1.3)
Technical and professional ability
III.1.5)
Information about reserved contracts
III.2)
Conditions related to the contract
III.2.2)
Contract performance conditions:
III.2.3)
Information about staff responsible for the performance of the contract
Section IV: Procedure
IV.1)
Description
IV.1.1)
Type of procedure
Open procedure
IV.1.3)
Information about a framework agreement or a dynamic purchasing system
IV.1.4)
Information about reduction of the number of solutions or tenders during negotiation or dialogue
IV.1.6)
Information about electronic auction
IV.1.8)
Information about the Government Procurement Agreement (GPA)
The procurement is covered by the Government Procurement Agreement: no
IV.2)
Administrative information
IV.2.1)
Previous publication concerning this procedure
IV.2.2)
Time limit for receipt of tenders or requests to participate
Date: 10/08/2017
Local time: 14:00
IV.2.3)
Estimated date of dispatch of invitations to tender or to participate to selected candidates
IV.2.4)
Languages in which tenders or requests to participate may be submitted:
Danish
IV.2.6)
Minimum time frame during which the tenderer must maintain the tender
IV.2.7)
Conditions for opening of tenders
Date: 10/08/2017
Local time: 14:00
Section VI: Complementary information
VI.1)
Information about recurrence
This is a recurrent procurement: no
VI.2)
Information about electronic workflows
VI.3)
Additional information:
VI.4)
Procedures for review
VI.4.1)
Review body
Klagenævnet for udbud
Dahlerups Pakhus — Langelinie Allé 17
København Ø
2100
Denmark
Telephone: +45 35291000
E-mail:
klfu@erst.dk
VI.4.2)
Body responsible for mediation procedures
VI.4.3)
Review procedure
VI.4.4)
Service from which information about the review procedure may be obtained
Konkurrence- og Forbrugerstyrelsen
Carl Jacobsens Vej 35
Valby
2500
Denmark
Telephone: +45 4171500
E-mail:
kfst@kfst.dk
VI.5)
Date of dispatch of this notice:
22/06/2017
BREAKING